HIGH ASPECT RATIO SiLICON NANOFABRICATION (HARSiN)
نویسندگان
چکیده
A simplified process to fabricate high aspect ratio nanostructures in silicon combining electron beam lithography and deep reactive ion etching (DRIE) is presented. A stable process (HARSiN) has been developed without the need for complicated resist/hard mask processing or complex dry etch technologies. This is achieved using commercially available ZEP520A resist from Nippon Zeon Co., Ltd which allows high resolution ebeam imaging (≤50nm) as well as affords high plasma etch resistance to a continuous room temperature carbon/fluorine DRIE Si etch chemistry developed in this work. Using this simplified lithography/etch process sequence, high aspect ratio (>14:1) silicon nanometer structures are reported for nanotechnology applications, which are reviewed in this paper.
منابع مشابه
Nanofabrication of high aspect ratio structures using an evaporated resist containing metal.
Organic electron beam resists are typically not resistant to the plasma etching employed to transfer the pattern into the underlying layer. Here, the authors present the incorporation of a metal hard mask material into negative resist polystyrene by co-evaporation of the polystyrene and the metal onto a substrate. With a volume ratio of 1:15 between Cr and polystyrene, this nanocomposite resist...
متن کاملHigh-Aspect Ratio Nanofabrication for Hard X-Ray Zone Plates
Hard x-ray nanoimaging enables structural investigations of newmaterials for many applications. For high-resolution experiments, zone plate x-ray optics are commonly chosen. Two methods of zone plate nanofabrication are presented in this thesis. Zone plates are circular diffraction gratings with radially decreasing grating period. Their optical resolution depends on the width of the smallest zo...
متن کاملCatalyst Self-Assembly for Scalable Patterning of Sub 10 nm Ultrahigh Aspect Ratio Nanopores in Silicon.
Nanoporous silicon (NPSi) has received significant attention for its potential to contribute to a large number of applications, but has not yet been extensively implemented because of the inability of current state-of-the-art nanofabrication techniques to achieve sufficiently small pore size, high aspect ratio, and process scalability. In this work we describe the fabrication of NPSi via a modi...
متن کاملSingle-photon-multi-layer-interference lithography for high-aspect-ratio and three-dimensional SU-8 micro-/nanostructures
We report microstructures of SU-8 photo-sensitive polymer with high-aspect-ratio, which is defined as the ratio of height to in-plane feature size. The highest aspect ratio achieved in this work exceeds 250. A multi-layer and single-photon lithography approach is used in this work to expose SU-8 photoresist of thickness up to 100 μm. Here, multi-layer and time-lapsed writing is the key concept ...
متن کاملInvestigation of optical absorptance of one-dimensionally periodic silicon gratings as solar absorbers for solar cells.
A rigorous design using periodic silicon (Si) gratings as absorbers for solar cells in visible and near-infrared regions is numerically presented. The structure consists of a subwavelength Si grating layer on top of an Si substrate. Ranges of grating dimensions are preliminary considered satisfying simple and feasible fabrication techniques with an aspect ratio defined as the ratio of the grati...
متن کامل